In this study, the graphitic amorphous carbon (g-C) thin films were deposited by the ion beam sputtering deposition (IBSD) technique on glass substrates. The effect of ion beam energy on the optical and structural properties of thin films was investigated in the wide range from 1. 8 keV to 5 keV. The results of investigation about optical and structural properties using UV-visible spectroscopy and Raman spectroscopy respectively showed a direct correlation between structural and physical developments. Raman spectra indicated a structural transition from graphite to nano-crystalline graphite phase. The values of ID/IG ratio, optical transparency and optical band gap depend on the ion beam energy; all of them increased by increasing argon ion beam energy from 3 keV, which is associated with a decrease in the film thickness. Furthermore, the sheet resistance of the samples was measured by the four-point probe (FPP) followed similar trends of these structural properties. According to Tauc equation the maximum optical band gap was equal to 3. 75 eV by the graphite crystallites (with sp2 bands (La)) equal to 5 nm in amorphous carbon thin film deposited with the highest argon ion beam energy of 5 keV.

Aluminum nitride (AlN) thin films have potential applications in microelectronic and optoelectronic devices. In this study, AlN thin films with different thicknesses were deposited on silicon substrate by single ion beam sputtering method. The X-ray diffraction (XRD) spectra revealed that the structure of films with thickness of 50-150 nm was amorphous, while the polycrystalline hexagonal AlN with a rough surface was observed at a thickness of 300 nm. Also, the formation of AlN in amorphous films is identified by Fourier transform infrared (FTIR) spectroscopy. Atomic force microscopy (AFM) study confirms that the surface roughness and average grain size of films increased with film thickness.

In this study the effect of substrate temperature (from room temperature (RT) to 400° C) on the sructural and physical properties of cabon thin films were investigated. The films were prepared by ion beam sputtering deposition technique on glass substrate. Optical and structural properties were studied by UV-visible spectroscopy, Raman spectroscopy and atomic force microscopy, respectively. The results showed that optical transparency decreased with the increase in the substrate temperature. Raman spectra indicated a structural transition from amorphous to graphite-like phase by increasing temperatures since in the spectra; D peak disappeared in the layer at the substrate temperature of 400° C. The result of sheet resistance and the optical band gap showed the reduction trend by the increase in the substrate temperature from 100 to 400° C. However the enhancement of the surface roughness with the substrate temperature was observed. In the layer prepered with the substrate temperature equal to 100 ° C, a minimum size of the graphite crystallites (with sp2 bands (La)) was equal to 0. 36 nm and a maximum optical band gap was equal to 3 eV.

Focused ion beam method (FIB), as one of the most powerful equipment, has a wide range application in the field of sample preparation, inspection and processing of equipment and machining in various fields such as semiconductors, metals, ceramics, polymers and life sciences. On the other hand, scanning electron microscopy is one of the strategic tools for advancing, analyzing and investigating researches especially in the nano fields. By studying morphology, topography, phase structures and chemical compounds, it can provide comprehensive information on the types of samples. Nowadays, in order to improve the efficiency, it is possible to investigation three-dimensional structures on the micro and nano scale, the possibility of studying on the site, the possibility of preparing sequential films and the ability to create images and control all the machining and preparation steps of the samples, a combination of these two techniques in the field of research, the technique of focused ion beam-scanning electron microscopy (FIB-SEM) has been presented. Due to the expansion of Nano scale research and industrial projects and the increasing need for advanced equipment to investigate and analyze them, the FIB-SEM technique, as one of the most fundamental diagnostic devices It is very important. Therefore, in this paper, the structure, function, and some of the applications of this technique are investigated.

The main goal of this work was to examination the structural and compositional changes in the Polypropylene (PP) fabrics caused by ion irradiation. In this work, the PP fabric was irradiated with CO2 ions. The implantation conditions (i.e, exposure time, beam current, and discharge power) were changed to control the extent of surface modification. Dye ability of the untreated sample and treated sample under different conditions were investigated by using a 3% wt aqueous solution of a basic dyestuff.The obtained data show that, ion beam processing of PP fabrics allows an adjustable modification of their surface properties. The functional groups on the surface of samples were examined using FTIR spectrometer. Moreover, dyeing properties for treated fabrics has been tested. Significant increase in color strength has been achieved. Morphology of samples was examined by Scanning Electron Microscopy (SEM).

In this study the effect of substrate temperature on the structural properties of zirconium nitride (ZrN) coatings prepared by ion beam sputtering on the glass and silicon substrates was investigated. Rutherford Back Scattering (RBS) and X-Ray Diffraction (XRD) analyses were performed to evaluate the coating thickness and structure respectively. The ZrN coatings presented a preferential crystalline orientation following the [111] axis at all temperatures. RBS results showed an increase in coating thickness with the increase of temperature up to 400oC due to reaction kinetic for the formation of Zr-N monomers. The decrease of thickness at 450oC is probably due to the increase in coating density and decrease in grain size at this temperature.

Carbon ion energy is a key factor in determining the amount of sp3 bonds in the structure of the amorphous carbon film and its like-diamond nature. In this study, the structural evolution of diamond-like carbon coating based on the mechanism of sp3 bond formation of amorphous carbon under the influence of the ion beam energy in the radio frequency ion-beam deposition process were investigated. For this purpose, the parameter of ion beam energy was 200, 300, and 400 eV ​​ for the deposition of DLC coatings. Raman and X-ray spectroscopy (XPS) analyzes were used to evaluate the structure and chemical composition of the coatings. Also, in order to determine the effect of ion beam energy on the surface roughness and thickness of the applied coatings, atomic force microscope (AFM) and field emission scanning electron microscope (FESEM) were used. Hardness and elastic modulus were measured by nanohardness test. According to the results of Raman analysis, the lowest value of ID/IG ratio was obtained in ion beam energy of 300 eV, which was equal to 0.66. The results of XPS analysis showed the lowest amount of sp2 bonds in the diamond-like carbon film at ion beam energy of 300 eV. Also, results of AFM analysis showed at ion beam energy of 300 eV, the surface roughness of diamond-like carbon coating has the lowest value. Due to the highest amount of sp3 bonds in the ion beam energy of 300 eV, the diamond-like carbon coating had the highest hardness and was equal to 10.6 GPa.

In this paper, the design and simulation of ion source based on a helicon plasma generator and its corresponding extraction system for design of the neutral beam injection heating system of a sample tokamak like Damavand tokamak using COMSOL software have been investigated. Based on our previous calculations, to increase the electron temperature of this tokamak to 300 eV and the ion temperature to 150 eV, it requires a neutral beam injection system with energy 4. 5 KeV, 6. 7 A current, and 30. 15 kW power. In this regard, in the present model, a dense helicon plasma source with an electron density of 5. 51×1018 m-3, an electron temperature of 2. 8 eV and an extraction system with 280 holes (3. 5 mm in diameter) and 7 A ion beam for this heating system were designed, simulated and presented. Also, in this design, all the optical issues of the ion beam such as divergence, space charge, and beam size which can affect the beam quality are investigated.